Area-Selective Etching of Poly(methyl methacrylate) Films by
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Effect of SIS treatment on the etch resistance of PMMA and ZEP520A. (a)
Electron beam induced removal of PMMA layer used for graphene transfer
Area-Selective Etching of Poly(methyl methacrylate) Films by Catalytic Decomposition
Playing with sizes and shapes of colloidal particles via dry etching methods - ScienceDirect
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Strategy used for Al 2 O 3 mask fabrication and subsequent nanopillar
Fluorine-containing polymeric inhibitor for highly selective and durable area-selective atomic layer deposition - ScienceDirect
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